Materials Synthesis and Processing

9.

Gas-Phase Synthesis and Deposition

9.1.

Chemical Vapor Deposition

9.1.1.

CVD Fundamentals

9.1.1.1.

Precursor Chemistry

9.1.1.2.

Reaction Mechanisms

9.1.1.3.

9.1.1.4.

Surface Reactions

9.1.2.

Atmospheric Pressure CVD

9.1.3.

Low-Pressure CVD

9.1.4.

Plasma-Enhanced CVD

9.1.4.1.

Plasma Generation

9.1.4.2.

Ion Bombardment Effects

9.1.5.

Metal-Organic CVD

9.1.5.1.

Precursor Selection

9.1.5.2.

Decomposition Pathways

9.1.6.

Atomic Layer Deposition

9.1.6.1.

Self-Limiting Reactions

9.1.6.2.

9.2.

Physical Vapor Deposition

9.2.1.

Thermal Evaporation

9.2.1.1.

Evaporation Sources

9.2.1.2.

Vacuum Requirements

9.2.1.3.

Film Growth Mechanisms

9.2.2.

9.2.2.1.

9.2.2.2.

9.2.2.3.

Magnetron Sputtering

9.2.2.4.

Reactive Sputtering

9.2.3.

Pulsed Laser Deposition

9.2.3.1.

Laser-Target Interactions

9.2.3.2.

9.2.3.3.

9.2.4.

Molecular Beam Epitaxy

9.2.4.1.

Ultra-High Vacuum Systems

9.2.4.2.

9.2.4.3.

Growth Monitoring

9.3.

Gas-Phase Nanoparticle Synthesis

9.3.1.

Flame Synthesis

9.3.2.

Plasma Synthesis

9.3.3.

9.3.4.

Chemical Vapor Condensation

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8. Solution-Based Synthesis Methods

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10. Melt Processing and Crystal Growth